2024-03-29T09:14:41Z
https://u-ryukyu.repo.nii.ac.jp/oai
oai:u-ryukyu.repo.nii.ac.jp:02000975
2023-08-03T05:29:21Z
1642838163960:1642838338003
1642838403551:1642838406845
Evaluation of crystalline germanium thin films electrodeposited on copper substrates from propylene glycol electrolyte
Saitou, Masatoshi
Sakae, K
Oshikawa, W
open access
germanium
electroplating
X-ray diffraction
infrared spectroscopy
AFM
roughness
Germanium thin films electrochemically deposited at 300 K from a solution of GeCl4, in propylene glycol were investigated using X-ray diffraction (XRD), infrared (IR) spectroscopy and atomic force microscopy (AFM). XRD reveals that the germanium electrodeposits are of crystalline structure and have the preferred crystallographic growth orientation [220]. The presence of the hydrogen bonding in the germanium films such as Ge-H and Ge-H-2 is shown from the IR absorption and does not cause a phase transition from crystalline structures to amorphous structures. The AFM images exhibit anomalous surface roughening behaviors in growth that deviate from statistical surface growth models and indicate a transition from rough surfaces to smooth surfaces.
論文
Elsevier Science B.V.
2003-01-01
eng
journal article
AM
http://hdl.handle.net/20.500.12000/392
http://hdl.handle.net/20.500.12000/392
https://u-ryukyu.repo.nii.ac.jp/records/2000975
http://www.sciencedirect.com/science/journal/02578972
10.1016/S0257-8972(02)00576-5
0257-8972
AA10652003
Surface & Coatings Technology
162
1
101
105
https://u-ryukyu.repo.nii.ac.jp/record/2000975/files/18-SurfCoatTech_161(1)101.pdf