2026-03-15T04:32:48Z https://u-ryukyu.repo.nii.ac.jp/oai

oai:u-ryukyu.repo.nii.ac.jp:02000974 2025-02-18T11:12:22Z 1642838163960:1642838338003 1642838403551:1642838406845

Characterization of electrodeposited nickel film surfaces using atomic force microscopy Saitou, Masatoshi Oshikawa, W Makabe, A Atomic force microscopy Electrochemistry Fourier transform method Fractal dimension Nickel Scaling Surface roughness Microstructures of nickel surfaces electrodeposited on indium tin oxides coated glasses are investigated using atomic force microscopy. The fractal dimension D and Hurst exponent H of the nickel surface images are determined from a frequency analysis method proposed by Aguilar et al. [J. Microsc. 172 (1993) 233] and from Hurst rescaled range analysis. The two methods are found to give the same value of the fractal dimension D similar to 2.0. The roughness exponent a and growth exponent beta that characterize scaling behaviors of the surface growth in electrodeposition are calculated using the height-difference correlation function and interface width in Fourier space. The exponents of alpha similar to 1.0 and beta similar to 0.8 show that the surface growth does not belong to the universality classes theoretically predicted by statistical growth models. 論文 http://purl.org/coar/resource_type/c_6501 Elsevier Science 2002-09 AM 9 63 1689 1685 http://hdl.handle.net/20.500.12000/398 0022-3697 AA00704949 Journal of Physics and Chemistry of Solids http://hdl.handle.net/20.500.12000/398 https://u-ryukyu.repo.nii.ac.jp/records/2000974 eng http://www.sciencedirect.com/science/journal/00223697 10.1016/S0022-3697(01)00254-2 open access