2024-05-20T21:02:06Z
https://u-ryukyu.repo.nii.ac.jp/oai
oai:u-ryukyu.repo.nii.ac.jp:02000974
2023-08-03T05:29:23Z
1642838163960:1642838338003
1642838403551:1642838406845
Characterization of electrodeposited nickel film surfaces using atomic force microscopy
Saitou, Masatoshi
Oshikawa, W
Makabe, A
Atomic force microscopy
Electrochemistry
Fourier transform method
Fractal dimension
Nickel
Scaling
Surface roughness
Microstructures of nickel surfaces electrodeposited on indium tin oxides coated glasses are investigated using atomic force microscopy. The fractal dimension D and Hurst exponent H of the nickel surface images are determined from a frequency analysis method proposed by Aguilar et al. [J. Microsc. 172 (1993) 233] and from Hurst rescaled range analysis. The two methods are found to give the same value of the fractal dimension D similar to 2.0. The roughness exponent a and growth exponent beta that characterize scaling behaviors of the surface growth in electrodeposition are calculated using the height-difference correlation function and interface width in Fourier space. The exponents of alpha similar to 1.0 and beta similar to 0.8 show that the surface growth does not belong to the universality classes theoretically predicted by statistical growth models.
論文
http://purl.org/coar/resource_type/c_6501
Elsevier Science
2002-09
AM
http://hdl.handle.net/20.500.12000/398
0022-3697
AA00704949
Journal of Physics and Chemistry of Solids
9
63
1689
1685
eng
http://www.sciencedirect.com/science/journal/00223697
10.1016/S0022-3697(01)00254-2
open access