@article{oai:u-ryukyu.repo.nii.ac.jp:02000971,
 author = {Saitou, Masatoshi and Hokama, M and Oshikawa, W},
 issue = {1-2},
 journal = {Applied Surface Science},
 month = {Dec},
 note = {The kinetic surface roughening of the polished (110) plane of a single-crystal nickel is investigated using atomic force microscopy. The polished (110) surfaces exhibit the scaling behavior characterized by the roughness exponent alpha = 0.83 +/- 0.05, the growth exponent beta = 0.83 +/- 0.07 and the skewness = -0.52 +/- 0.06, whose values are compared with the theoretical values in statistical growth models in deposition. These characteristics indicate that the scaling behavior of the polished nickel surfaces can be related to a statistical growth model of nonlinear diffusion dynamics in deposition., 論文},
 pages = {79--83},
 title = {Scaling behavior of polished (110) single-crystal nickel surfaces},
 volume = {185},
 year = {2001}
}