@article{oai:u-ryukyu.repo.nii.ac.jp:02000974,
 author = {Saitou, Masatoshi and Oshikawa, W and Makabe, A},
 issue = {9},
 journal = {Journal of Physics and Chemistry of Solids},
 month = {Sep},
 note = {Microstructures of nickel surfaces electrodeposited on indium tin oxides coated glasses are investigated using atomic force microscopy. The fractal dimension D and Hurst exponent H of the nickel surface images are determined from a frequency analysis method proposed by Aguilar et al. [J. Microsc. 172 (1993) 233] and from Hurst rescaled range analysis. The two methods are found to give the same value of the fractal dimension D similar to 2.0. The roughness exponent a and growth exponent beta that characterize scaling behaviors of the surface growth in electrodeposition are calculated using the height-difference correlation function and interface width in Fourier space. The exponents of alpha similar to 1.0 and beta similar to 0.8 show that the surface growth does not belong to the universality classes theoretically predicted by statistical growth models., 論文},
 pages = {1685--1689},
 title = {Characterization of electrodeposited nickel film surfaces using atomic force microscopy},
 volume = {63},
 year = {2002}
}