{"created":"2022-01-27T07:46:24.760775+00:00","id":2003834,"links":{},"metadata":{"_buckets":{"deposit":"46c99f52-25dc-4cca-abd0-161c2b7b1cd0"},"_deposit":{"id":"2003834","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"2003834"},"status":"published"},"_oai":{"id":"oai:u-ryukyu.repo.nii.ac.jp:02003834","sets":["1642837622505:1642837855274:1642837863705","1642838403551:1642838406845"]},"author_link":[],"item_1617186331708":{"attribute_name":"Title","attribute_value_mlt":[{"subitem_1551255647225":"水素ガス反応性RFマグネトロンスパッタリング法によるダイヤモンド状炭素薄膜の作製と評価","subitem_1551255648112":"ja"},{"subitem_1551255647225":"Synthesis of Diamond Like Carbon Film by Hydrogen Gas Reactive RF Magnetron Sputtering, and its Properties","subitem_1551255648112":"en"}]},"item_1617186419668":{"attribute_name":"Creator","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"渡久地, 實","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"新垣, 修","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"山下, 崇","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"Toguchi, Minoru","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Arakaki, Osamu","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Yamashita, Takashi","creatorNameLang":"en"}]}]},"item_1617186476635":{"attribute_name":"Access Rights","attribute_value_mlt":[{"subitem_1522299639480":"open access","subitem_1600958577026":"http://purl.org/coar/access_right/c_abf2"}]},"item_1617186609386":{"attribute_name":"Subject","attribute_value_mlt":[{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Diamond-like-carbon film"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Amorphous carbon film"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Diamond film"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Passivation film"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Reactive rf-magnetron sputtering"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Gaseous phase deposition"}]},"item_1617186626617":{"attribute_name":"Description","attribute_value_mlt":[{"subitem_description":"Diamond like carbon (DLC) films prepared by hydrogen gas reactive rf magnetron sputter deposition from a graphite target onto low temperature substrate (room temperature～160°C) have been examined using techniques of electric resistivity measurement and transmission electron microscopy. Electric resistivities of these films were the order of 10^10～10^13$\\Omega$・cm, which increased with increasing hydrogen gas pressure. Electron diffraction patterns of these films indicated predominantly amorphous structure. Although 8 rings pattern in the electron diffraction observed by the selected area, the observed interplanar spacings coincided with the data by ASTM card for diamond (6-0675), and the number of these area increased with decreasing the gas pressure. Oblique-texture electron diffraction patterns were observed in the films which were prepared at the higher gas pressure (0.6～1.0Torr).","subitem_description_type":"Other"},{"subitem_description":"紀要論文","subitem_description_type":"Other"}]},"item_1617186643794":{"attribute_name":"Publisher","attribute_value_mlt":[{"subitem_1522300295150":"ja","subitem_1522300316516":"琉球大学工学部"}]},"item_1617186702042":{"attribute_name":"Language","attribute_value_mlt":[{"subitem_1551255818386":"jpn"}]},"item_1617186783814":{"attribute_name":"Identifier","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/20.500.12000/5547"}]},"item_1617186920753":{"attribute_name":"Source Identifier","attribute_value_mlt":[{"subitem_1522646500366":"ISSN","subitem_1522646572813":"0389-102X"},{"subitem_1522646500366":"NCID","subitem_1522646572813":"AN0025048X"}]},"item_1617186941041":{"attribute_name":"Source Title","attribute_value_mlt":[{"subitem_1522650068558":"ja","subitem_1522650091861":"琉球大学工学部紀要"}]},"item_1617187056579":{"attribute_name":"Bibliographic Information","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1988-09","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"36","bibliographicPageEnd":"75","bibliographicPageStart":"63"}]},"item_1617258105262":{"attribute_name":"Resource Type","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_1617265215918":{"attribute_name":"Version Type","attribute_value_mlt":[{"subitem_1522305645492":"VoR","subitem_1600292170262":"http://purl.org/coar/version/c_970fb48d4fbd8a85"}]},"item_1617605131499":{"attribute_name":"File","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_access","filename":"No36p63.pdf","mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://u-ryukyu.repo.nii.ac.jp/record/2003834/files/No36p63.pdf"},"version_id":"cdbc6195-3ca6-4505-a7f4-0eea051071c7"}]},"item_title":"水素ガス反応性RFマグネトロンスパッタリング法によるダイヤモンド状炭素薄膜の作製と評価","item_type_id":"15","owner":"1","path":["1642837863705","1642838406845"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2008-04-02"},"publish_date":"2008-04-02","publish_status":"0","recid":"2003834","relation_version_is_last":true,"title":["水素ガス反応性RFマグネトロンスパッタリング法によるダイヤモンド状炭素薄膜の作製と評価"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-10-31T01:45:11.129480+00:00"}