{"_buckets": {"deposit": "0e5a4b92-3c03-497e-8350-78ff94ad3d2c"}, "_deposit": {"id": "2004853", "owners": [1], "pid": {"revision_id": 0, "type": "depid", "value": "2004853"}, "status": "published"}, "_oai": {"id": "oai:u-ryukyu.repo.nii.ac.jp:02004853", "sets": ["1642838403123", "1642838406845"]}, "author_link": [], "item_1617186331708": {"attribute_name": "Title", "attribute_value_mlt": [{"subitem_1551255647225": "電荷移動反応を伴う電析による薄膜形成過程に関する研究", "subitem_1551255648112": "ja"}, {"subitem_1551255647225": "Study on Charge Transfer Reactions in Electrodeposition", "subitem_1551255648112": "en"}]}, "item_1617186419668": {"attribute_name": "Creator", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "斉藤, 正敏", "creatorNameLang": "ja"}]}, {"creatorNames": [{"creatorName": "押川, 渡", "creatorNameLang": "ja"}]}, {"creatorNames": [{"creatorName": "Saitou, Masatoshi", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Oshikawa, Wataru", "creatorNameLang": "en"}]}]}, "item_1617186476635": {"attribute_name": "Access Rights", "attribute_value_mlt": [{"subitem_1522299639480": "open access", "subitem_1600958577026": "http://purl.org/coar/access_right/c_abf2"}]}, "item_1617186609386": {"attribute_name": "Subject", "attribute_value_mlt": [{"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "交換電流密度"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "電気二重層"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "均一反応"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "ステップ成長"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "マルチステップ法"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "反応速度定数"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "transient response"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "過渡反応"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "electrochemical impedance"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "核形成"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "ヘルムホルツ面"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "電気化学インピーダンス"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "反応速度"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "Helmholtz layer"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "multi-step technique"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "電荷移動反応"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "nsec"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "homogeneous charge-transfer reaction"}, {"subitem_1522299896455": "ja", "subitem_1522300014469": "Other", "subitem_1523261968819": "活性化エネルギー"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "step growth"}]}, "item_1617186626617": {"attribute_name": "Description", "attribute_value_mlt": [{"subitem_description": "科研費番号: 15560021", "subitem_description_type": "Other"}, {"subitem_description": "平成15年度～16年度科学研究費補助金（基盤研究（C)(2)）研究成果報告書", "subitem_description_type": "Other"}, {"subitem_description": "研究概要：15年度の研究成果。 1.界面における電荷移動反応に関して (1)ナイキスト表示においてインダクティブループは、存在せず、反応は、多段階である。 (2)Ni^\u003c2+\u003eイオンの結晶化は2段階反応で進行すると推定され、Ni^\u003c2+\u003e+e^- →Ni^+_\u003cads\u003eが反応全体を律速する。 (3)指数α及びβの値が0.5に近い値:界面での電子の交換は、電解液内のヘルムホルツ外面で行われる。 2.界面反応の基礎的物性に関して界面反応の基礎物性として重要な電気二重層の電気容量、反応速度定数と拡散係数、電流交換密度を求めるためのマルチステップ法を提案し、解析方法を開発した。 16年度の研究業績 1.界面反応の基礎的物性に関して我々が開発したマルチステップ法が汎用性を持つことを示すためにAgの電析過程に適用し、界面反応の基礎物性として重要な電気二重層の電気容量、反応速度定数と拡散係数、電流交換密度を求めることができることを示した。解析のより得られた基礎物性量の結果は、交換電流密度:7.8±0.2mA/cm^2、電気2重相の容量:52.1±6.5μFcm^\u003c-2\u003e、反応速度と反応速度定数の比:_\u003ck1\u003e√\u003cD\u003eは、一定値である 2.界面での核形成・成長過程に関して nsecの立ち上がりを持つ微小電流の印加に対する電極間のポテンシャル応答の測定と解析から (1)ポテンシャル応答は、3つの領域からなり、初期の領域は、2段階ステップによるニッケルイオンの原子化過程に対応し、第2の領域は、それら原子ニッケルが幾つかのステップに組み込まれる過程、第3は、多くのステップが活動し、原子を組み込む過程に対応していること。 (2)第一の領域における反応の活性化エネルギーは、実験値と一致する。 (3)第3の領域におけるニッケルイオンが原子化し、ステップに組み込まれるのに必要なエネルギーは、0.12から0.13eVであることを明らかにした。", "subitem_description_type": "Other"}, {"subitem_description": "研究概要 : (1)Charge transfer reactions in the Helmholtz layer in electrodeposition Electrochemical impedance spectroscopy measurements under a small alternating current density were performed to make investigations into electrochemical reactions on (110) single-crystalline nickel surfaces in nickel sulfamate electrolyte. The reaction impedance shows a power law of the ac modulation frequency and two exponents for the reaction resistance and reaction capacitance are found to agree with the values predicted by a homogeneous charge-transfer reaction model. In addition, the Nyquist diagrams exhibit the absence of inductive loops. A condition for the existence of inductive loops derived in this study suggests that the electrocrystallization of Ni^\u003c2+\u003e ions may take place in the slow reaction step Ni^\u003c2+\u003e+e^-→Ni^+_\u003cabs\u003e and in the fast reaction step Ni^+_\u003cabs\u003e+e^-→Ni. (2)Transient process in the Helmholtz layer in electrodeposition A method is described for the study of the kinetics of electrode reactions on the basis of analytical solutions of three transient electrochemical processes comprising the diffusion of ions, charge-transfer reactions and a charging process of an electrochemical double-layer. Multi-pulse currents are applied to a working electrode and the potentials are recorded. The measured potential-time curves agree with those predicted by the analytical solution. The kinetic constant, exchange current density and double-layer capacitance are determined from the measured potential-time curves using the analytical solution. (3)Surface nucleation and growth in electrodeposition Voltage-time curves in surface growth on single crystalline nickel electrodes in nickel sulfamate have been measured under a fixed current density with a nanosecond rise-time. The transient voltage-time curves in a two-electrode system exhibit three continuous regions that correspond to the reduction of nickel ions by two-step electrochemical reactions, the crystallization process such as nucleation and growth, and steady state surface growth. The measured voltage-time curves are well consistent with the calculation results predicted by phenomenological equations proposed in this study.", "subitem_description_type": "Other"}, {"subitem_description": "未公開：P.43以降（別刷論文のため）", "subitem_description_type": "Other"}, {"subitem_description": "研究報告書", "subitem_description_type": "Other"}]}, "item_1617186643794": {"attribute_name": "Publisher", "attribute_value_mlt": [{"subitem_1522300295150": "ja", "subitem_1522300316516": "斉藤正敏"}]}, "item_1617186702042": {"attribute_name": "Language", "attribute_value_mlt": [{"subitem_1551255818386": "jpn"}]}, "item_1617186783814": {"attribute_name": "Identifier", "attribute_value_mlt": [{"subitem_identifier_type": "HDL", "subitem_identifier_uri": "http://hdl.handle.net/20.500.12000/12228"}]}, "item_1617186920753": {"attribute_name": "Source Identifier", "attribute_value_mlt": [{"subitem_1522646500366": "NCID", "subitem_1522646572813": "BA74598460"}]}, "item_1617187056579": {"attribute_name": "Bibliographic Information", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2005-03", "bibliographicIssueDateType": "Issued"}}]}, "item_1617258105262": {"attribute_name": "Resource Type", "attribute_value_mlt": [{"resourcetype": "research report", "resourceuri": "http://purl.org/coar/resource_type/c_18ws"}]}, "item_1617265215918": {"attribute_name": "Version Type", "attribute_value_mlt": [{"subitem_1522305645492": "VoR", "subitem_1600292170262": "http://purl.org/coar/version/c_970fb48d4fbd8a85"}]}, "item_1617605131499": {"attribute_name": "File", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_access", "download_preview_message": "", "file_order": 0, "filename": "15560021.pdf", "future_date_message": "", "is_thumbnail": false, "mimetype": "", "size": 0, "url": {"objectType": "fulltext", "url": "https://u-ryukyu.repo.nii.ac.jp/record/2004853/files/15560021.pdf"}, "version_id": "3adce533-e798-4036-8012-768ba0641730"}]}, "item_title": "電荷移動反応を伴う電析による薄膜形成過程に関する研究", "item_type_id": "15", "owner": "1", "path": ["1642838403123", "1642838406845"], "permalink_uri": "http://hdl.handle.net/20.500.12000/12228", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2009-09-01"}, "publish_date": "2009-09-01", "publish_status": "0", "recid": "2004853", "relation": {}, "relation_version_is_last": true, "title": ["電荷移動反応を伴う電析による薄膜形成過程に関する研究"], "weko_shared_id": -1}