{"created":"2022-01-27T08:18:28.079546+00:00","id":2004872,"links":{},"metadata":{"_buckets":{"deposit":"09a72143-7df6-4d3e-b3e3-4fa225b37b31"},"_deposit":{"id":"2004872","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"2004872"},"status":"published"},"_oai":{"id":"oai:u-ryukyu.repo.nii.ac.jp:02004872","sets":["1642837622505:1642837855274:1642837869466","1642838403551:1642838406845"]},"author_link":[],"item_1617186331708":{"attribute_name":"Title","attribute_value_mlt":[{"subitem_1551255647225":"X線二結晶法によるストライプ状SiO_2/GaAs基板の格子歪の測定","subitem_1551255648112":"ja"},{"subitem_1551255647225":"Measurement of Lattice Strain of Striped Si0_2/GaAs Substrate by X-ray Double Crystal Method","subitem_1551255648112":"en"}]},"item_1617186419668":{"attribute_name":"Creator","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"前濱, 剛廣","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"新里, 樹","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"安冨祖, 忠信","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"Maehama, Takehiro","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Shinzato, Itsuki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Afuso, Chusin","creatorNameLang":"en"}]}]},"item_1617186476635":{"attribute_name":"Access Rights","attribute_value_mlt":[{"subitem_1522299639480":"open access","subitem_1600958577026":"http://purl.org/coar/access_right/c_abf2"}]},"item_1617186609386":{"attribute_name":"Subject","attribute_value_mlt":[{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"X-ray double crystal method"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Gallium arsenide"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Silicon dioxide film"},{"subitem_1522299896455":"en","subitem_1522300014469":"Other","subitem_1523261968819":"Lattice strain"}]},"item_1617186626617":{"attribute_name":"Description","attribute_value_mlt":[{"subitem_description":"A measurement method for relative lattice strain of striped Si0_2/GaAs and the results of the measurements are presented. As the fundamental of the method the peak - splitting angle of the rocking curve of X - ray double crystal method due to the relative lattice strain is used. The method is applied to some samples with different stripe widths. The results of the measurements reveal the following facts. The relative lattice strain varies inversely as the stripe width. The equation of the relationship is given by assuming the exponential distribution of the lattice strain. The relative lattice strain is divided into two terms by elastic theory. One is the spacing strain of the parallel atomic planes and the other is the tilting strain of the planes.","subitem_description_type":"Other"},{"subitem_description":"紀要論文","subitem_description_type":"Other"}]},"item_1617186643794":{"attribute_name":"Publisher","attribute_value_mlt":[{"subitem_1522300295150":"ja","subitem_1522300316516":"琉球大学工学部"}]},"item_1617186702042":{"attribute_name":"Language","attribute_value_mlt":[{"subitem_1551255818386":"jpn"}]},"item_1617186783814":{"attribute_name":"Identifier","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/20.500.12000/12408"}]},"item_1617186920753":{"attribute_name":"Source Identifier","attribute_value_mlt":[{"subitem_1522646500366":"ISSN","subitem_1522646572813":"0389-102X"},{"subitem_1522646500366":"NCID","subitem_1522646572813":"AN0025048X"}]},"item_1617186941041":{"attribute_name":"Source Title","attribute_value_mlt":[{"subitem_1522650068558":"ja","subitem_1522650091861":"琉球大学工学部紀要"}]},"item_1617187056579":{"attribute_name":"Bibliographic Information","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1994-03","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"47","bibliographicPageEnd":"87","bibliographicPageStart":"77"}]},"item_1617258105262":{"attribute_name":"Resource Type","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_1617265215918":{"attribute_name":"Version Type","attribute_value_mlt":[{"subitem_1522305645492":"VoR","subitem_1600292170262":"http://purl.org/coar/version/c_970fb48d4fbd8a85"}]},"item_1617605131499":{"attribute_name":"File","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_access","filename":"No47p77.pdf","mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://u-ryukyu.repo.nii.ac.jp/record/2004872/files/No47p77.pdf"},"version_id":"6cacca87-4837-47de-a2fa-8caa787013d3"}]},"item_title":"X線二結晶法によるストライプ状SiO_2/GaAs基板の格子歪の測定","item_type_id":"15","owner":"1","path":["1642837869466","1642838406845"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2009-09-07"},"publish_date":"2009-09-07","publish_status":"0","recid":"2004872","relation_version_is_last":true,"title":["X線二結晶法によるストライプ状SiO_2/GaAs基板の格子歪の測定"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-10-31T02:24:45.640943+00:00"}