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  1. 紀要論文
  2. 琉球大学工学部紀要
  3. 44号
  1. 部局別インデックス
  2. 工学部

RFマグネトロンスパッタリング法によるYBaCuO超伝導薄膜の作製

http://hdl.handle.net/20.500.12000/14448
http://hdl.handle.net/20.500.12000/14448
d02d0fba-d067-4577-8bc1-20ab2db43cf3
名前 / ファイル ライセンス アクション
No44p137.pdf No44p137.pdf
Item type デフォルトアイテムタイプ(フル)(1)
公開日 2010-01-05
タイトル
タイトル RFマグネトロンスパッタリング法によるYBaCuO超伝導薄膜の作製
言語 ja
作成者 渡久地, 実

× 渡久地, 実

ja 渡久地, 実

比嘉, 晃

× 比嘉, 晃

ja 比嘉, 晃

島袋, 敏行

× 島袋, 敏行

ja 島袋, 敏行

Toguchi, Minoru

× Toguchi, Minoru

en Toguchi, Minoru

Higa, Akira

× Higa, Akira

en Higa, Akira

Shimabukuro, Toshiyuki

× Shimabukuro, Toshiyuki

en Shimabukuro, Toshiyuki

アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
主題
言語 en
主題Scheme Other
主題 high-T_e superconducting film
言語 en
主題Scheme Other
主題 YBaCuO thin film
言語 en
主題Scheme Other
主題 RF magnetron
言語 en
主題Scheme Other
主題 sputtering
言語 en
主題Scheme Other
主題 film composition
言語 en
主題Scheme Other
主題 fluorescent X-ray
内容記述
内容記述タイプ Other
内容記述 High T_e superconducting YBaCuO thin film have been prepared on MgO (100) substrate by RF magnetron sputtering using single target under sputtering gas pressures ranging from 5 mTorr to 1Torr. Critical temperature T_<con> of the films on the substrates positioned right above target center decreased with increasing sputtering gas pressure, while that of the films on substrates positioned right above erosion area decreased at pressure below 50mTorr. The composition ratios Ba/Y and Cu/Y of films were increased with increasing sputtering gas pressure. This tendency was remarkable at position right above erosion area.
内容記述タイプ Other
内容記述 紀要論文
出版者
言語 ja
出版者 琉球大学工学部
言語
言語 jpn
資源タイプ
資源タイプ departmental bulletin paper
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
識別子
識別子 http://hdl.handle.net/20.500.12000/14448
識別子タイプ HDL
収録物識別子
収録物識別子タイプ ISSN
収録物識別子 0389-102X
収録物識別子タイプ NCID
収録物識別子 AN0025048X
収録物名
言語 ja
収録物名 琉球大学工学部紀要
書誌情報
号 44, p. 137-144
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