{"_buckets": {"deposit": "00dfa023-5c36-45be-968b-7d577364b941"}, "_deposit": {"id": "2000845", "owners": [1], "pid": {"revision_id": 0, "type": "depid", "value": "2000845"}, "status": "published"}, "_oai": {"id": "oai:u-ryukyu.repo.nii.ac.jp:02000845", "sets": ["1642838338003", "1642838406845"]}, "author_link": [], "item_1617186331708": {"attribute_name": "Title", "attribute_value_mlt": [{"subitem_1551255647225": "Surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films", "subitem_1551255648112": "en"}]}, "item_1617186419668": {"attribute_name": "Creator", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Saitou, Masatoshi", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Oshikawa, W", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Mori, M", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Makabe, A", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "\u6589\u85e4, \u6b63\u654f", "creatorNameLang": "ja-Kana"}]}]}, "item_1617186476635": {"attribute_name": "Access Rights", "attribute_value_mlt": [{"subitem_1522299639480": "open access", "subitem_1600958577026": "http://purl.org/coar/access_right/c_abf2"}]}, "item_1617186499011": {"attribute_name": "Rights", "attribute_value_mlt": [{"subitem_1522650717957": "en", "subitem_1522651041219": "(c) 2006 The Electrochemical Society"}]}, "item_1617186609386": {"attribute_name": "Subject", "attribute_value_mlt": [{"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "MOLECULAR-BEAM EPITAXY"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "COPPER ELECTRODEPOSITS"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "INSTABILITY"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "DEPOSITION"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "NUCLEATION"}, {"subitem_1522299896455": "en", "subitem_1522300014469": "Other", "subitem_1523261968819": "DIFFUSION"}]}, "item_1617186626617": {"attribute_name": "Description", "attribute_value_mlt": [{"subitem_description": "The surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films at a low current density is investigated using atomic force microscopy (AFM). The growth exhibits scaling behaviors characterized by the roughness exponent alpha and growth exponent beta. The analysis of the AFM images of the nickel thin films reveals that (i) for direct current electrodeposition: alpha = 0.96 and beta = 0.78, and (ii) for pulse current electrodeposition: alpha = 0.92 and beta = 0.65. Each value of a for the two techniques is almost in agreement with that predicted by a statistical model of linear diffusion dynamics. X-ray diffraction of the nickel thin films indicates the presence of preferred growth orientations that are related to the growth exponent beta \u003e 1/2.", "subitem_description_type": "Other"}, {"subitem_description": "\u8ad6\u6587", "subitem_description_type": "Other"}]}, "item_1617186643794": {"attribute_name": "Publisher", "attribute_value_mlt": [{"subitem_1522300295150": "en", "subitem_1522300316516": "The Electrochemical Society"}]}, "item_1617186702042": {"attribute_name": "Language", "attribute_value_mlt": [{"subitem_1551255818386": "eng"}]}, "item_1617186783814": {"attribute_name": "Identifier", "attribute_value_mlt": [{"subitem_identifier_type": "HDL", "subitem_identifier_uri": "http://hdl.handle.net/20.500.12000/113"}]}, "item_1617186920753": {"attribute_name": "Source Identifier", "attribute_value_mlt": [{"subitem_1522646500366": "ISSN", "subitem_1522646572813": "00134651"}, {"subitem_1522646500366": "NCID", "subitem_1522646572813": "AA00697016"}]}, "item_1617186941041": {"attribute_name": "Source Title", "attribute_value_mlt": [{"subitem_1522650068558": "en", "subitem_1522650091861": "Journal of the Electrochemical Society"}]}, "item_1617187056579": {"attribute_name": "Bibliographic Information", "attribute_value_mlt": [{"bibliographicIssueNumber": "12", "bibliographicPageEnd": "C783", "bibliographicPageStart": "C780", "bibliographicVolumeNumber": "148"}]}, "item_1617258105262": {"attribute_name": "Resource Type", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_1617265215918": {"attribute_name": "Version Type", "attribute_value_mlt": [{"subitem_1522305645492": "VoR", "subitem_1600292170262": "http://purl.org/coar/version/c_970fb48d4fbd8a85"}]}, "item_1617353299429": {"attribute_name": "Relation", "attribute_value_mlt": [{"subitem_1522306287251": {"subitem_1522306382014": "DOI", "subitem_1522306436033": "10.1149/1.1415548"}}, {"subitem_1522306287251": {"subitem_1522306382014": "URI", "subitem_1522306436033": "http://www.ecsdl.org/JES/"}}]}, "item_1617605131499": {"attribute_name": "File", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_access", "download_preview_message": "", "file_order": 0, "filename": "saitou_m07.pdf", "future_date_message": "", "is_thumbnail": false, "mimetype": "", "size": 0, "url": {"objectType": "fulltext", "url": "https://u-ryukyu.repo.nii.ac.jp/record/2000845/files/saitou_m07.pdf"}, "version_id": "b81cb0d0-a28c-4cdd-b821-009a2420a6da"}]}, "item_title": "Surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films", "item_type_id": "15", "owner": "1", "path": ["1642838338003", "1642838406845"], "permalink_uri": "http://hdl.handle.net/20.500.12000/113", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2007-03-01"}, "publish_date": "2007-03-01", "publish_status": "0", "recid": "2000845", "relation": {}, "relation_version_is_last": true, "title": ["Surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films"], "weko_shared_id": -1}