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  1. 学術雑誌論文
  2. その他
  1. 部局別インデックス
  2. 工学部

Surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films

http://hdl.handle.net/20.500.12000/113
http://hdl.handle.net/20.500.12000/113
751d450a-9ef8-4450-b63d-23208a32fe18
名前 / ファイル ライセンス アクション
saitou_m07.pdf saitou_m07.pdf
Item type デフォルトアイテムタイプ(フル)(1)
公開日 2007-03-01
タイトル
タイトル Surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films
言語 en
作成者 Saitou, Masatoshi

× Saitou, Masatoshi

en Saitou, Masatoshi

Oshikawa, W

× Oshikawa, W

en Oshikawa, W

Mori, M

× Mori, M

en Mori, M

Makabe, A

× Makabe, A

en Makabe, A

斉藤, 正敏

× 斉藤, 正敏

ja-Kana 斉藤, 正敏

アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利情報
言語 en
権利情報 (c) 2006 The Electrochemical Society
主題
言語 en
主題Scheme Other
主題 MOLECULAR-BEAM EPITAXY
言語 en
主題Scheme Other
主題 COPPER ELECTRODEPOSITS
言語 en
主題Scheme Other
主題 INSTABILITY
言語 en
主題Scheme Other
主題 DEPOSITION
言語 en
主題Scheme Other
主題 NUCLEATION
言語 en
主題Scheme Other
主題 DIFFUSION
内容記述
内容記述タイプ Other
内容記述 The surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films at a low current density is investigated using atomic force microscopy (AFM). The growth exhibits scaling behaviors characterized by the roughness exponent alpha and growth exponent beta. The analysis of the AFM images of the nickel thin films reveals that (i) for direct current electrodeposition: alpha = 0.96 and beta = 0.78, and (ii) for pulse current electrodeposition: alpha = 0.92 and beta = 0.65. Each value of a for the two techniques is almost in agreement with that predicted by a statistical model of linear diffusion dynamics. X-ray diffraction of the nickel thin films indicates the presence of preferred growth orientations that are related to the growth exponent beta > 1/2.
内容記述タイプ Other
内容記述 論文
出版者
言語 en
出版者 The Electrochemical Society
言語
言語 eng
資源タイプ
資源タイプ journal article
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
識別子
識別子 http://hdl.handle.net/20.500.12000/113
識別子タイプ HDL
関連情報
関連識別子
識別子タイプ DOI
関連識別子 10.1149/1.1415548
関連識別子
識別子タイプ URI
関連識別子 http://www.ecsdl.org/JES/
収録物識別子
収録物識別子タイプ ISSN
収録物識別子 00134651
収録物識別子タイプ NCID
収録物識別子 AA00697016
収録物名
言語 en
収録物名 Journal of the Electrochemical Society
書誌情報
巻 148, 号 12, p. C780-C783
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