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  1. 紀要論文
  2. 琉球大学教育学部紀要
  3. 31号
  1. 部局別インデックス
  2. 教育学部

Ni蒸着膜における内部応力の入射角依存性

http://hdl.handle.net/20.500.12000/2123
http://hdl.handle.net/20.500.12000/2123
1be31112-7b34-49b6-b018-8c8fe24c61de
名前 / ファイル ライセンス アクション
Vol31p343.pdf Vol31p343.pdf
Item type デフォルトアイテムタイプ(フル)(1)
公開日 2007-10-25
タイトル
タイトル Ni蒸着膜における内部応力の入射角依存性
言語 ja
作成者 新里, 祐宏

× 新里, 祐宏

ja 新里, 祐宏

Shinzato, Sukehiro

× Shinzato, Sukehiro

en Shinzato, Sukehiro

アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
内容記述
内容記述タイプ Other
内容記述 The internal stress in vapour-deposited Ni films has been studied as a function of the incidence angle of the evaprant. The main findings are as follows:\n1. The internal stress had a constant value for thickness between 0.1 and 0.6μm.\n2. The total stress decresed with increasing the incidence angle and the decreasing rate of the total stress had the maximum value at the incidence angle of 45°.\n3. The stress anisotropy increased with the increase of the incidence angle.\n4. The total stress tended to decrease with increasing the deposition rate for all incidence angles.
内容記述タイプ Other
内容記述 紀要論文
出版者
言語 ja
出版者 琉球大学教育学部
言語
言語 jpn
資源タイプ
資源タイプ departmental bulletin paper
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
識別子
識別子 http://hdl.handle.net/20.500.12000/2123
識別子タイプ HDL
収録物識別子
収録物識別子タイプ ISSN
収録物識別子 0386-5746
収録物識別子タイプ NCID
収録物識別子 AN10144831
収録物名
言語 ja
収録物名 琉球大学教育学部紀要 第一部・第二部
書誌情報
号 31, p. 343-347
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